A mask set or a photomask set is a series of electronic data that define geometry for the photolithography steps of semiconductor fabrication. Each of the physical masks generated from this data is called a photomask.

A mask set for a modern process typically contains as many as twenty or more masks, each of which defines a specific photolithographic step in the semiconductor fabrication process. Examples of masks include:

  • p-well
  • n-well
  • active
  • poly
  • p-select
  • n-select
  • contact
  • metal1, 2, 3...

For more information, see photolithography and semiconductor manufacturing.


* Saint, Christopher and Judy. (2002). IC Layout Basics. McGraw-Hill. ISBN 0-07-138625-4